ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX

貢獻的翻譯標題: 應用具信心指標之虛擬量測的先進製程控制機制

Fan-Tien Cheng (Inventor)

研究成果: Patent

摘要

PROBLEM TO BE SOLVED: To provide a method capable of effectively considering data quality of VM in an R2R model, of overcoming a problem of being impossible to consider a degree of reliance in a VM feedback loop for R2R control and delayed metrology, and of improving APC efficacy. SOLUTION: An APC system comprises a process tool 100, a metrology tool 110, a virtual metrology (VM) module 120, a reliance index (RI) module 122, and an R2R controller 130. The APC system acquires multiple sets of history process data for processing multiple history workpieces, to be used for the process tool, and uses the metrology tool to acquire multiple history metrology data of history workpieces. The system uses the sets of history process data and history metrology values to build an estimation model based on an estimation algorithm,
貢獻的翻譯標題應用具信心指標之虛擬量測的先進製程控制機制
原文English
專利號特許5292602
出版狀態Published - 2012 二月 16

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