ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX

Fan-Tien Cheng

ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX

貢獻的翻譯標題: 應用具信心指標之虛擬量測的先進製程控制機制

Fan-Tien Cheng (Inventor)

製造資訊與系統研究所

研究成果: Patent

摘要

PROBLEM TO BE SOLVED: To provide a method capable of effectively considering data quality of VM in an R2R model, of overcoming a problem of being impossible to consider a degree of reliance in a VM feedback loop for R2R control and delayed metrology, and of improving APC efficacy. SOLUTION: An APC system comprises a process tool 100, a metrology tool 110, a virtual metrology (VM) module 120, a reliance index (RI) module 122, and an R2R controller 130. The APC system acquires multiple sets of history process data for processing multiple history workpieces, to be used for the process tool, and uses the metrology tool to acquire multiple history metrology data of history workpieces. The system uses the sets of history process data and history metrology values to build an estimation model based on an estimation algorithm,

貢獻的翻譯標題	應用具信心指標之虛擬量測的先進製程控制機制
原文	English
專利號	特許5292602
出版狀態	Published - 2012 2月 16

UN SDG

此研究成果有助於以下永續發展目標

SDG 9 產業、創新與基礎設施

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@misc{6b0039694b8e4406aff66a394a717c47,

title = "ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX",

abstract = "PROBLEM TO BE SOLVED: To provide a method capable of effectively considering data quality of VM in an R2R model, of overcoming a problem of being impossible to consider a degree of reliance in a VM feedback loop for R2R control and delayed metrology, and of improving APC efficacy. SOLUTION: An APC system comprises a process tool 100, a metrology tool 110, a virtual metrology (VM) module 120, a reliance index (RI) module 122, and an R2R controller 130. The APC system acquires multiple sets of history process data for processing multiple history workpieces, to be used for the process tool, and uses the metrology tool to acquire multiple history metrology data of history workpieces. The system uses the sets of history process data and history metrology values to build an estimation model based on an estimation algorithm,",

author = "Fan-Tien Cheng",

year = "2012",

month = feb,

day = "16",

language = "English",

type = "Patent",

note = "特許5292602",

}

TY - PAT

T1 - ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX

AU - Cheng, Fan-Tien

PY - 2012/2/16

Y1 - 2012/2/16

N2 - PROBLEM TO BE SOLVED: To provide a method capable of effectively considering data quality of VM in an R2R model, of overcoming a problem of being impossible to consider a degree of reliance in a VM feedback loop for R2R control and delayed metrology, and of improving APC efficacy. SOLUTION: An APC system comprises a process tool 100, a metrology tool 110, a virtual metrology (VM) module 120, a reliance index (RI) module 122, and an R2R controller 130. The APC system acquires multiple sets of history process data for processing multiple history workpieces, to be used for the process tool, and uses the metrology tool to acquire multiple history metrology data of history workpieces. The system uses the sets of history process data and history metrology values to build an estimation model based on an estimation algorithm,

AB - PROBLEM TO BE SOLVED: To provide a method capable of effectively considering data quality of VM in an R2R model, of overcoming a problem of being impossible to consider a degree of reliance in a VM feedback loop for R2R control and delayed metrology, and of improving APC efficacy. SOLUTION: An APC system comprises a process tool 100, a metrology tool 110, a virtual metrology (VM) module 120, a reliance index (RI) module 122, and an R2R controller 130. The APC system acquires multiple sets of history process data for processing multiple history workpieces, to be used for the process tool, and uses the metrology tool to acquire multiple history metrology data of history workpieces. The system uses the sets of history process data and history metrology values to build an estimation model based on an estimation algorithm,

M3 - Patent

M1 - 特許5292602

ER -

ADVANCED PROCESS CONTROL SYSTEM AND METHOD UTILIZING VIRTUAL METROLOGY WITH RELIANCE INDEX

摘要

UN SDG

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