Air-stable perovskite photovoltaic cells with low temperature deposited NiOx as an efficient hole-transporting material

A. K.Mahmud Hasan, Itaru Raifuku, N. Amin, Yasuaki Ishikawa, D. K. Sarkar, K. Sobayel, Mohammad R. Karim, Anwar Ul-Hamid, H. Abdullah, Md Shahiduzzaman, Yukiharu Uraoka, Kamaruzzaman Sopian, Md Akhtaruzzaman

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

摘要

The electron-beam physical vapor deposition (EBPVD) technique was selected for nickel oxide (NiOx) film deposition at room temperatures. NiOx film (18 nm thick) was deposited as a hole transporting material (HTM) for inverted perovskite solar cells (PSCs) onto a fluorine-doped tin oxide (FTO)-coated glass substrate at a chamber vacuum pressure of 4.6104 Pa. PSCs were fabricated as a glass/FTO/NiOx(HTM)/CH3NH3PbI3/PC61BM/BCP/Ag structure with as-deposited and annealed (500 °C for 30 min) NiOx films. Under 100 mW cm2 illumination, as-deposited and annealed NiOx as HTM in PSCs (0.16 cm2) showed a high-power conversion efficiency (PCE) of 13.20% and 13.24%, respectively. The as-deposited and annealed PSCs retained 72.2% and 76.96% of their initial efficiency in ambient conditions, correspondingly. This study highlights the possibility of achieving highly crystalline and finely disseminated NiOx films by EBPVD for fabricating efficient inverted PSCs.

原文English
頁(從 - 到)1801-1816
頁數16
期刊Optical Materials Express
10
發行號10
DOIs
出版狀態Published - 2020 八月 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

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