Ammonia Sensing Characteristics of a Tungsten Trioxide Thin-Film-Based Sensor

Tzu Chieh Chou, Ching Hong Chang, Cheng Lee, Wen Chau Liu

研究成果: Article同行評審

11 引文 斯高帕斯(Scopus)

摘要

A tungsten trioxide (WO3) thin-film-based ammonia sensor device prepared using radio frequency sputtering is reported and studied. A very thin WO3 film (10 nm) is employed in the studied device. Experimentally, the studied device exhibits a high ammonia sensing response of 13.7 (at 1000-ppm NH3/air, 250 °C), an extremely low detection level (≤10-ppb NH3/air, 250 °C), a relatively low optimal operating temperature of 250 °C, and a widespread sensing concentration range. Furthermore, the device shows advantages including a simple structure, easy fabrication, and relatively lower operating temperature (≤250 °C). Thus, the proposed WO3 thin-film-based sensor device is promising for high-performance ammonia sensing applications.

原文English
文章編號8556505
頁(從 - 到)696-701
頁數6
期刊IEEE Transactions on Electron Devices
66
發行號1
DOIs
出版狀態Published - 2019 一月

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

指紋 深入研究「Ammonia Sensing Characteristics of a Tungsten Trioxide Thin-Film-Based Sensor」主題。共同形成了獨特的指紋。

引用此