An application of Mueller matrix polarimetry for characterising properties of thin film with surface roughness

Quoc Hung Phan, Yu Lung Lo

研究成果: Conference article同行評審

摘要

A new Mueller ellipsometry method was proposed for characterising the optical properties of thin films with rough surfaces. The validity of the proposed study is demonstrated by comparing the experimental results of the refractive index and thickness of thin film with the analytical results. Furthermore, the proposed study extracted successfully the surface roughness of thin film samples in a non contact optical manner. It provides a potential solution to replace the well-known effective approximate medium (EMA) method in dealing with the fine coarse rough surface thin film.

原文English
文章編號05006
期刊MATEC Web of Conferences
32
DOIs
出版狀態Published - 2015 十二月 2
事件International Symposium of Optomechatronics Technology, ISOT 2015 - Neuchatel, Switzerland
持續時間: 2015 十月 142015 十月 16

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Engineering(all)

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