An efficient tagging point selection algorithm to facilitate OPC process

Lih-Shyang Chen, Lian Yong Lin, Jing Jou Tang, Meng Lieh Sheu, Yong Zhi Chen

研究成果: Conference contribution

摘要

The rapid advance of resolution enhancement technique (RET) has driven the integrated circuits to the nanometer-scale era. Optical proximity correction (OPC) is one of the RET techniques that can be employed to reshape the mask patterns for correcting the distortion due to the optical proximity effect (OPE). In this paper, an Optical Performance Index (OPI) is proposed as an evaluation criteria for ope performance. Also, an efficient tagging point selection algorithm is developed to facilitate the ope process. Based on the OPI and selection algorithm, the tagging points for ope can be easily located on either the regular patterns, e.g., rectangle or polygon, or the irregular patterns such as convex or concave patterns. Experimental results show that the quantity of storage and computing time can be dramatically reduced.

原文English
主出版物標題2010 International Symposium on Next-Generation Electronics, ISNE 2010 - Conference Program
頁面85-88
頁數4
DOIs
出版狀態Published - 2010 十二月 1
事件2010 International Symposium on Next-Generation Electronics, ISNE 2010 - Kaohsiung, Taiwan
持續時間: 2010 十一月 182010 十一月 19

出版系列

名字2010 International Symposium on Next-Generation Electronics, ISNE 2010 - Conference Program

Other

Other2010 International Symposium on Next-Generation Electronics, ISNE 2010
國家/地區Taiwan
城市Kaohsiung
期間10-11-1810-11-19

All Science Journal Classification (ASJC) codes

  • 電氣與電子工程

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