An extra photoresist film fabricated in liquid crystal lens array to prevent occurrence of disclination lines

Chia Shan He, Ping Hung Tang, Wei Yi Lu, Ya-Ting, Chun Hung Lin, Chia Rong Sheu

研究成果: Conference contribution

摘要

A proposed method used to prevent the disclination line occurrence in liquid crystal lens array, which is usage of an extra non-patterned or patterned SU8 photoresist films coated on surfaces of patterned ITO films in lens structures. As a result, the problem of disclination line occurrence is effectively prevented.

原文English
主出版物標題21st International Display Workshops 2014, IDW 2014
發行者Society for Information Display
頁面121-122
頁數2
ISBN(電子)9781510827790
出版狀態Published - 2014
事件21st International Display Workshops 2014, IDW 2014 - Niigata, Japan
持續時間: 2014 十二月 32014 十二月 5

出版系列

名字21st International Display Workshops 2014, IDW 2014
1

Other

Other21st International Display Workshops 2014, IDW 2014
國家/地區Japan
城市Niigata
期間14-12-0314-12-05

All Science Journal Classification (ASJC) codes

  • 硬體和架構
  • 人機介面
  • 電子、光磁材料
  • 電氣與電子工程

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