An Improved Heterostructure-Emitter Bipolar Transistor (HEBT)

Wen Chau Liu, Wen Shiung Lour

研究成果: Article同行評審

50 引文 斯高帕斯(Scopus)

摘要

An N-A10.5Ga0.5As/n-GaAs heterostructure-emitter bipolar transistor (HEBT), grown by MBE, has been fabricated with improved performance. The A10.5Ga0.5As layer with higher valence-band offset ΔEv offers better confinement of minority carriers (holes). A small offset voltage of about 80 mV and a high common-emitter current gain of 180 were measured for large-area devices. On the other hand, the adequate design of an n-GaAs emitter layer also plays an important role in device performance. The strongly knee-shaped characteristics and reachthrough effect were observed in those devices fabricated with a thin n-GaAs emitter layer.

原文English
頁(從 - 到)474-476
頁數3
期刊IEEE Electron Device Letters
12
發行號9
DOIs
出版狀態Published - 1991 9月

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 電氣與電子工程

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