摘要
An N-A10.5Ga0.5As/n-GaAs heterostructure-emitter bipolar transistor (HEBT), grown by MBE, has been fabricated with improved performance. The A10.5Ga0.5As layer with higher valence-band offset ΔEv offers better confinement of minority carriers (holes). A small offset voltage of about 80 mV and a high common-emitter current gain of 180 were measured for large-area devices. On the other hand, the adequate design of an n-GaAs emitter layer also plays an important role in device performance. The strongly knee-shaped characteristics and reachthrough effect were observed in those devices fabricated with a thin n-GaAs emitter layer.
原文 | English |
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頁(從 - 到) | 474-476 |
頁數 | 3 |
期刊 | IEEE Electron Device Letters |
卷 | 12 |
發行號 | 9 |
DOIs | |
出版狀態 | Published - 1991 9月 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 電氣與電子工程