An improved two-load method for whole-field complete photoelastic fringe analysis

T. Y. Chen, H. L. Lee, Y. C. Chou

研究成果: Article同行評審

5 引文 斯高帕斯(Scopus)

摘要

An improved two-load method for whole-field complete determination of photoelastic parameters is presented. The dark-field isoclinic images are used to determine the isoclinic angles. Using two isoclinic maps obtained from two different loads effectively compensates the indeterminable points. The use of dark-field and light-field photoelastic images for normalization extends the two-load method to analyze dark-field photoelastic fringe patterns and avoids model movement. Larger errors on the determined fringe orders are further reduced by a least-squares quadric fitting. The results are compared well to the theoretical ones. Further comparison of the improved two-load method and the two-wavelength method are given.

原文English
頁(從 - 到)199-203
頁數5
期刊Journal of Mechanics
21
發行號3
DOIs
出版狀態Published - 2005 9月

All Science Journal Classification (ASJC) codes

  • 凝聚態物理學
  • 機械工業
  • 應用數學

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