Analysis of the isothermal compression in nanoimprint lithography assuming a power-law fluid

I. C. Hsin, W. B. Young

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

摘要

One of the choices for defining a nano pattern in micro fabrication is to use the nanoimprint lithography. This method is also known as a hot embossing lithography due to its inherited process technique from the compression process. It is important to determine the appropriate conditions of pressure, temperature, and time in the nanoimprint lithography process. To determine the right conditions for nanoimprint lithography, one has to understand the polymer flow behavior during the imprinting process. In this study, a simplified analytical model was developed based on a power-law fluid to predict the polymer flow during the imprinting process. Under a constant imprint force, the imprint depth on a polymer film can be predicted using this model. Experimental tests were also conducted to verify the results. It was demonstrated that the model can provide reasonable results on the imprint depth.

原文English
頁(從 - 到)24-29
頁數6
期刊International Polymer Processing
23
發行號1
DOIs
出版狀態Published - 2008 3月

All Science Journal Classification (ASJC) codes

  • 化學工程 (全部)
  • 聚合物和塑料
  • 工業與製造工程
  • 材料化學

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