Application of combinatorial methodologies for work function engineering of metal gate/high-κ advanced gate stacks

M. L. Green, Kao-Shuo Chang, S. DeGendt, T. Schram, J. Hattrick-Simpers

研究成果: Article同行評審

9 引文 斯高帕斯(Scopus)

摘要

This paper uses combinatorial methodologies to investigate the effect of TaN-AlN metal gate electrode composition on the work function, for (TaN-AlN)/Hf-Si-O/SiO2/Si capacitors. We demonstrate the efficacy of the combinatorial technique by plotting work function for more than thirty Ta1-xAlxNy compositions, with x varying from 0.05 to 0.50. The work function is shown to continuously decrease, from about 4.9 to about 4.7 eV, over this range. Over the same range, oxide fixed charge is seen to go from about -2.5 × 1012 cm-3 to about zero. The work functions reported here are about 0.1 eV higher than in a previous study, but are still about 0.2 eV smaller than required for PMOS device applications.

原文English
頁(從 - 到)2209-2212
頁數4
期刊Microelectronic Engineering
84
發行號9-10
DOIs
出版狀態Published - 2007 九月 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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