AZO/Au/AZO tri-layer thin films for the very low resistivity transparent electrode applications

Chien Hsun Chu, Hung Wei Wu, Jow Lay Huang

研究成果: Article

20 引文 斯高帕斯(Scopus)

摘要

Aluminum-doped ZnO (AZO)/gold/AZO tri-layer structures with very low resistivity and high transmittance are prepared by simultaneous RF magnetron sputtering (for AZO) and ion sputtering (for Au). The properties of the tri-layer films are investigated at different Au layer thicknesses (5-20 nm). The effects of Au layer thickness and the role of Au on the transmission properties of the tri-layer films were investigated. The very low resistivity of 1.01 × 10-5 Ω cm, mobility of 27.665 cm2 V-1 s-1, and carrier concentration of 4.563 × 1022 cm-3 were obtained at an Au layer thickness of 20 nm. The peak transmittance of 86.18% at 650-nm wavelength was obtained at an Au layer thickness of 8 nm. These results show the films to be a good candidate for high-quality electrode scheme in various display applications.

原文English
頁(從 - 到)117-121
頁數5
期刊Materials Science and Engineering B: Solid-State Materials for Advanced Technology
186
發行號1
DOIs
出版狀態Published - 2014 八月

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

指紋 深入研究「AZO/Au/AZO tri-layer thin films for the very low resistivity transparent electrode applications」主題。共同形成了獨特的指紋。

  • 引用此