Beam pen lithography based on focused laser diode beam with single microlens fabricated by excimer laser

Md Nazmul Hasan, Yung Chun Lee

研究成果: Article同行評審

10 引文 斯高帕斯(Scopus)

摘要

A method is proposed to minimize the focused spot size of an elliptically-diverging laser diode beam by means of a circular aperture and a single plano-convex aspherical microlens. The proposed microlens is fabricated using an excimer laser dragging method and has two different profiles in the x- and y-axis directions. The focused spot size of the beam is examined both numerically and experimentally. The feasibility of the proposed approach for beam pen lithography applications is demonstrated by patterning dotted, straight-line and spiral features on a photo resist layer followed by thin gold layer deposition and metal lift-off. The minimum feature size for dotted pattern is around 2.57 μm, while the minimum line-widths for straight-line and spiral pattern are 3.05 μm and 4.35 μm, respectively. Thus, the technique can be applied to write any arbitrary pattern for high-resolution lithography.

原文English
頁(從 - 到)4494-4505
頁數12
期刊Optics Express
23
發行號4
DOIs
出版狀態Published - 2015 2月 23

All Science Journal Classification (ASJC) codes

  • 原子與分子物理與光學

指紋

深入研究「Beam pen lithography based on focused laser diode beam with single microlens fabricated by excimer laser」主題。共同形成了獨特的指紋。

引用此