Carbon nanotube AFM probes for microlithography process control

Hao Chih Liu, David Fong, Gregory A. Dahlen, Marc Osborn, Sean Hand, Jason R. Osborne

研究成果: Conference contribution

17 引文 斯高帕斯(Scopus)


The use of carbon nanotubes (CNT) as probes for atomic force microscopy (AFM) has been studied worldwide for more than a decade; however, the industries have not widely accepted CNT probes in their day-to-day operation. In this work, we present a series of studies on the metrology performance of CNT probes in semiconductor industry. A total of 54 CNT probes were studied for tip geometry, and 11 probes were tested on production wafers from a variety of IC manufacturers. Five out of the 11 probes were further evaluated for tip lifetime in semiconductor manufacturing environments. Statistical measurement data and tip shape characterization results provide insights on the applications of CNT probes in microlithography process control. The recent advancements in AFM scan algorithms that enable the control and use of CNT probes were also discussed in this paper. Sidewall measurement data using tilted CNT probes, and the AFM image of a CNT probe showing a comparable resolution to that of transmission electron microscopy (TEM) were presented for the first time. The combination of advanced AFM system and CNT probes has proven to perform challenging metrology in 65 nm node and beyond.

主出版物標題Metrology, Inspection, and Process Control for Microlithography XX
出版狀態Published - 2006 七月 11
事件Metrology, Inspection, and Process Control for Microlithography XX - San Jose, CA, United States
持續時間: 2006 一月 202006 一月 23


名字Proceedings of SPIE - The International Society for Optical Engineering
6152 II


OtherMetrology, Inspection, and Process Control for Microlithography XX
國家/地區United States
城市San Jose, CA

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電腦科學應用
  • 應用數學
  • 電氣與電子工程


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