Channel width dependence of hot-carrier induced degradation in shallow trench isolated pMOSFETs

Kazunari Ishimaru, Jone F. Chen, Chenming Hu

研究成果: Conference contribution

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深入研究「Channel width dependence of hot-carrier induced degradation in shallow trench isolated pMOSFETs」主題。共同形成了獨特的指紋。

Engineering & Materials Science