Characteristics of GaAs/InGaP/GaAs doped channel camel-gate field-effect transistor

Kuo Hui Yu, Wen Lung Chang, Shun Ching Feng, Wen Chau Liu

研究成果: Article同行評審

摘要

The characteristics of GaAs/InGaP/GaAs camel-gate field-effect transistor (CAMFET) with various channel structures including the single-, double-, and triple-step doped channel are studied. A theoretical model is used to analyze the device performances with different structures. Experimentally, a triple-step doped channel GaAs/InGaP/GaAs CAMFET has been fabricated successfully and demonstrated. From the theoretical analysis and experimental results, the gate turn-on and breakdown voltages could be enhanced by using the large band gap InGaP layer and triple-step doped channel structure. Furthermore, the good transistor characteristics are observed. Hence the studied device shows a good potential for the practice circuit applications.

原文English
頁(從 - 到)2069-2075
頁數7
期刊Solid-State Electronics
44
發行號11
DOIs
出版狀態Published - 2000 11月 1

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 凝聚態物理學
  • 電氣與電子工程
  • 材料化學

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