Characteristics of thin-film-transistors based on Zn-In-Sn-O thin films prepared by co-sputtering system

K. J. Chen, F. Y. Hung, T. S. Lui, S. J. Chang, T. Y. Liao

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

摘要

This study presents the growth of ZITO film by co-sputtering system. By adjusting the chemical composition and electrical properties of ZITO, an amorphous ZITO (a-ZITO) matrix with a semiconducting character was used to apply in active layer for thin-film transistors (TFTs) device. The proposed a-ZITO channel layer with SiNx dielectric layer exhibited depletion mode operation. The device exhibited a subthreshold swing (SS) of 1.65V/dec, a field-effect mobility (μFE) of 2.57cm 2V -1 s -1, and an on/off current ratio (I on/I off) of 10 4. The small SS and an acceptable FE were associated with a smaller roughness and stable composition of ZITO channel layer.

原文English
頁(從 - 到)571-574
頁數4
期刊Materials Transactions
53
發行號3
DOIs
出版狀態Published - 2012

All Science Journal Classification (ASJC) codes

  • 材料科學(全部)
  • 凝聚態物理學
  • 材料力學
  • 機械工業

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