A radio frequency sputter deposition technique was used to deposit ZnO on Si specimens with surface metallization of copper. An ion beam sputter deposition technique was employed for the copper metallization. Crystalline sizes of ZnO thin films were found to be sensitive to the deposition temperature and insensitive to the O2/Ar ratio.
|頁（從 - 到）||2142-2148|
|期刊||Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films|
|出版狀態||Published - 2001 九月 1|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films