Characteristics of zinc oxide deposited on copper metallized Si substrates

Y. S. Chang; J. M. Ting

doi:10.1116/1.1376707

Characteristics of zinc oxide deposited on copper metallized Si substrates

Y. S. Chang
, J. M. Ting

研究成果: Article › 同行評審

1 引文斯高帕斯（Scopus）

摘要

A radio frequency sputter deposition technique was used to deposit ZnO on Si specimens with surface metallization of copper. An ion beam sputter deposition technique was employed for the copper metallization. Crystalline sizes of ZnO thin films were found to be sensitive to the deposition temperature and insensitive to the O₂/Ar ratio.

原文	English
頁（從 - 到）	2142-2148
頁數	7
期刊	Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
卷	19
發行號	5
DOIs	https://doi.org/10.1116/1.1376707
出版狀態	Published - 2001 9月

All Science Journal Classification (ASJC) codes

凝聚態物理學
表面和介面
表面、塗料和薄膜

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10.1116/1.1376707

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abstract = "A radio frequency sputter deposition technique was used to deposit ZnO on Si specimens with surface metallization of copper. An ion beam sputter deposition technique was employed for the copper metallization. Crystalline sizes of ZnO thin films were found to be sensitive to the deposition temperature and insensitive to the O2/Ar ratio.",

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AB - A radio frequency sputter deposition technique was used to deposit ZnO on Si specimens with surface metallization of copper. An ion beam sputter deposition technique was employed for the copper metallization. Crystalline sizes of ZnO thin films were found to be sensitive to the deposition temperature and insensitive to the O2/Ar ratio.

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U2 - 10.1116/1.1376707

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SN - 0734-2101

VL - 19

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JO - Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

IS - 5

ER -

Characteristics of zinc oxide deposited on copper metallized Si substrates

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