Characterization of one-dimension edge roughness from far-field irradiance at subwavelength-scale precision

Shu Chun Chu, Jyh Long Chern

研究成果: Article同行評審

2 引文 斯高帕斯(Scopus)

摘要

It is proposed and numerically verified that the one-dimensional edge roughness of test sample can be characterized by far-field irradiance measurement at subwavelength-scale precision with a constructed aperture playing as an optical ruler. The precision of the proposed scheme of measurement could be better than 3%, even when the edge roughness is in subwavelength-scale. The influence of sample thickness on the proposed measurement scheme is also investigated and considered.

原文English
頁(從 - 到)1997-2001
頁數5
期刊Optics Communications
281
發行號8
DOIs
出版狀態Published - 2008 4月 15

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 物理與理論化學
  • 電氣與電子工程

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