摘要
It is proposed and numerically verified that the one-dimensional edge roughness of test sample can be characterized by far-field irradiance measurement at subwavelength-scale precision with a constructed aperture playing as an optical ruler. The precision of the proposed scheme of measurement could be better than 3%, even when the edge roughness is in subwavelength-scale. The influence of sample thickness on the proposed measurement scheme is also investigated and considered.
| 原文 | English |
|---|---|
| 頁（從 - 到） | 1997-2001 |
| 頁數 | 5 |
| 期刊 | Optics Communications |
| 卷 | 281 |
| 發行號 | 8 |
| DOIs | |
| 出版狀態 | Published - 2008 四月 15 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Physical and Theoretical Chemistry
- Electrical and Electronic Engineering
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引用此
Chu, S. C., & Chern, J. L. (2008). Characterization of one-dimension edge roughness from far-field irradiance at subwavelength-scale precision. Optics Communications, 281(8), 1997-2001. https://doi.org/10.1016/j.optcom.2007.12.032