Characterization of subwavelength-scale marginal roughness from far-field irradiance

Jyh Long Chern, Shu Chun Chu

研究成果: Conference contribution

摘要

A constructed-aperture approach is proposed to measure marginal roughness by far-field irradiance. It is numerically shown that spatial profile could be retrieved with an error less than 3%, even its variation is in subwavelength scale.

原文English
主出版物標題Frontiers in Optics, FiO 2006
發行者Optical Society of America
ISBN(列印)1557528187, 9781557528186
出版狀態Published - 2006 一月 1
事件Frontiers in Optics, FiO 2006 - Rochester, NY, United States
持續時間: 2006 十月 102006 十月 10

出版系列

名字Optics InfoBase Conference Papers
ISSN(電子)2162-2701

Other

OtherFrontiers in Optics, FiO 2006
國家United States
城市Rochester, NY
期間06-10-1006-10-10

    指紋

All Science Journal Classification (ASJC) codes

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

引用此

Chern, J. L., & Chu, S. C. (2006). Characterization of subwavelength-scale marginal roughness from far-field irradiance. 於 Frontiers in Optics, FiO 2006 (Optics InfoBase Conference Papers). Optical Society of America.