Chemical oxide interfacial layer for the high-k-last/gate-last integration scheme

Ying Tsung Chen, Ssu I. Fu, Wen Tai Chiang, Chien Ting Lin, Shih Hung Tsai, Shao Wei Wang, Shoou Jinn Chang

研究成果: Article同行評審

9 引文 斯高帕斯(Scopus)

指紋

深入研究「Chemical oxide interfacial layer for the high-k-last/gate-last integration scheme」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Chemical Compounds