Comparison of equivalent oxide thickness and electrical properties of atomic layer deposited hafnium zirconate dielectrics with thermal or decoupled plasma nitridation process
- Chen Kuo Chiang
- , Chien Hung Wu
- , Chin Chien Liu
- , Jin Fu Lin
- , Chien Lun Yang
- , Jiun Yuan Wu
- , Shui Jinn Wang
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斯高帕斯（Scopus）