Comparison of structure and electron-field-emission behavior of chemical-vapor-deposited diamond and pulsed-laser-deposited diamond-like carbon films

Hsiu Fung Cheng, Yi Chun Chen, Yin Ling Wang, Yuan Yu Chen, Bor Jau Tsau, Tang Chen, I. Nan Lin

研究成果: Article同行評審

3 引文 斯高帕斯(Scopus)

摘要

The correlation between the structure and the electron-field-emission behavior of chemical-vapor-deposited (CVD) diamond films and those of pulsed-laser-deposited (PLD) diamond-like carbon (DLC) films is investigated. The CVD films contain crystalline diamonds (sp3-bonds) separated from amorphous carbon (sp2-bonds), possessing a large electron-field-emission current density [(Je)CVD = 140 μA/cm2 at 21.6 V/μm], a low turn-on field [(E0)CVD = 10 V/μm] and a single-value effective work function [(φe)CVD = 0.082 eV]. In contrast, the pulsed-laser-deposited DLC films exhibit even better electron field emission properties [(Je)DLC = 320 μA/cm2 at 21.6 V/μm, (E0)DLC -8 V/μm] and a wide range of effective work functions [(φe)DLC = 0.016-0.031 eV]. The superior electron-field-emission properties of DLC films, as compared with those of CVD diamonds, are ascribed to their nanostructured grains, which contain a mixture of sp3-bonds and sp2-bonds.

原文English
頁(從 - 到)1866-1871
頁數6
期刊Japanese Journal of Applied Physics
39
發行號4 A
DOIs
出版狀態Published - 2000

All Science Journal Classification (ASJC) codes

  • 一般工程
  • 一般物理與天文學

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