TY - JOUR
T1 - Competent visible light driven photocatalytic removal of gaseous styrene over TiO2/g-C3N4
T2 - Characterization, parameters, kinetics, mechanism
AU - Narindri Rara Winayu, Birgitta
AU - Liu, Yu Qian
AU - Chu, Hsin
N1 - Publisher Copyright:
© 2024 Taiwan Institute of Chemical Engineers
PY - 2024/11
Y1 - 2024/11
N2 - Background: Removal of volatile organic compounds (VOCs), including styrene, via photocatalytic oxidation is preferable. The photocatalytic activity of g-C3N4 and TiO2 are limited by its fast recombination rate and wide band gap, respectively. Method: This study examined improvement in photocatalytic degradation of styrene using g-C3N4 after doping with various proportions of TiO2. The best photocatalyst were also tested under various conditions (retention time, relative humidity, styrene concentration, and temperature) prior to study of reaction kinetics. Significant findings: 20 wt% TiO2/g-C3N4 presented the best styrene conversion and supported by characterization result. Formation of narrow band gap reached to 2.68 eV enhanced the performance of doped g-C3N4. Langmuir Hinshelwood model 4 presented a well fitted result with the experimental data.
AB - Background: Removal of volatile organic compounds (VOCs), including styrene, via photocatalytic oxidation is preferable. The photocatalytic activity of g-C3N4 and TiO2 are limited by its fast recombination rate and wide band gap, respectively. Method: This study examined improvement in photocatalytic degradation of styrene using g-C3N4 after doping with various proportions of TiO2. The best photocatalyst were also tested under various conditions (retention time, relative humidity, styrene concentration, and temperature) prior to study of reaction kinetics. Significant findings: 20 wt% TiO2/g-C3N4 presented the best styrene conversion and supported by characterization result. Formation of narrow band gap reached to 2.68 eV enhanced the performance of doped g-C3N4. Langmuir Hinshelwood model 4 presented a well fitted result with the experimental data.
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U2 - 10.1016/j.jtice.2024.105677
DO - 10.1016/j.jtice.2024.105677
M3 - Article
AN - SCOPUS:85199283340
SN - 1876-1070
VL - 164
JO - Journal of the Taiwan Institute of Chemical Engineers
JF - Journal of the Taiwan Institute of Chemical Engineers
M1 - 105677
ER -