Completely preventing disclination lines occurred in LC lens array via an additionally whole photoresist film

Pin Hung Tang, Yen Jen Chang, Chia-Rong Sheu

研究成果: Conference contribution

摘要

A simple and effective method to prevent disclination lines in liquid crystal (LC) lens array is proposed. By means of an extra whole photoresist film coated on hole-patterned ITO (indium tin oxide) electrodes, there will be no disclination line when electrically operating LC lens arrays.

原文English
主出版物標題22nd International Display Workshops, IDW 2015
發行者International Display Workshops
頁面515-517
頁數3
ISBN(電子)9781510845503
出版狀態Published - 2015 一月 1
事件22nd International Display Workshops, IDW 2015 - Otsu, Japan
持續時間: 2015 十二月 92015 十二月 11

出版系列

名字Proceedings of the International Display Workshops
1
ISSN(列印)1883-2490

Other

Other22nd International Display Workshops, IDW 2015
國家Japan
城市Otsu
期間15-12-0915-12-11

All Science Journal Classification (ASJC) codes

  • Computer Vision and Pattern Recognition
  • Human-Computer Interaction
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Radiology Nuclear Medicine and imaging

指紋 深入研究「Completely preventing disclination lines occurred in LC lens array via an additionally whole photoresist film」主題。共同形成了獨特的指紋。

  • 引用此

    Tang, P. H., Chang, Y. J., & Sheu, C-R. (2015). Completely preventing disclination lines occurred in LC lens array via an additionally whole photoresist film. 於 22nd International Display Workshops, IDW 2015 (頁 515-517). (Proceedings of the International Display Workshops; 卷 1). International Display Workshops.