Configuring AVM as a MES componConfiguring AVM as a MES component

Fan Tien Cheng, Jonathan Yung Cheng Chang, Chi An Kao, Ying Lin Chen, Ju Lei Peng

研究成果: Conference contribution

5 引文 斯高帕斯(Scopus)

摘要

A typical 65nm manufacturing process normally contains 400-500 process steps. Many factors in production line could cause production quality shift and/or drift. Especially, when a new process to include more functions in a die is under development, a higher failure rate will be encountered. As a result, frequent monitoring in both tool and process is required to detect the quality issue early so as to improve the process stability of semiconductor manufacturing. However, more tool and process monitoring means more metrology operation cost and longer cycle time. Recently, a promising technology denoted virtual metrology (VM) is blooming. VM can convert sampling inspection with metrology delay into real-time and on-line total inspection. Therefore, VM has now been designated by International SEMATECH Manufacturing Initiative (ISMI) and International Technology Roadmap for Semiconductors (ITRS) as one of the focus areas for the next generation factory realization roadmap of the semiconductor industry. The authors have developed the so-called automatic virtual metrology (AVM) system to implement and deploy the VM operations automatically. This paper proposes a novel manufacturing system that integrates AVM into the manufacturing execution system (MES). The interfaces among AVM, other MES components, and R2R (run-to-run) modules in the novel manufacturing system are also defined such that the capabilities of AVM can be accomplished. The AVM capabilities include 1) converting sampling inspection with metrology delay into real-time and on-line total inspection; 2) control/monitoring workpieces reduction/elimination; and 3) supporting wafer-to-wafer (W2W) advanced process control.

原文English
主出版物標題2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2010
頁面226-231
頁數6
DOIs
出版狀態Published - 2010
事件2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2010 - San Francisco, CA, United States
持續時間: 2010 7月 112010 7月 13

出版系列

名字ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings
ISSN(列印)1078-8743

Other

Other2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2010
國家/地區United States
城市San Francisco, CA
期間10-07-1110-07-13

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 一般工程
  • 工業與製造工程
  • 電氣與電子工程

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