Contact printing of metallic pattern and its applications on fabricating high-frequency surface acoustic wave (SAW) devices

Yung Chun Lee, Chun Hung Chen, Hsueh Liang Chen, Chin Hsin Liu, Cheng Yu Chiu, Hung Yi Lin

研究成果: Conference contribution

摘要

In this paper, two types of contact-printing methods for micro/nano-lithography are developed and their application on fabricating high-frequency surface acoustic wave (SAW) devices are investigated. First of all, a Light-Assisted Metal Film Patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments. Secondly, a Contact-Transfer and Mask-Embedded Lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nano-structures on various kinds of substrates. Applications of these two developed methods are demonstrated on the fabrication of high-frequency (∼2 GHz) surface acoustic wave (SAW) filters and resonators. Future developments and potential applications of these nanoimprinting and nano-patterning methods will be addressed.

原文English
主出版物標題ICSICT 2008 - 2008 9th International Conference on Solid-State and Integrated-Circuit Technology Proceedings
頁面2456-2459
頁數4
DOIs
出版狀態Published - 2008 12月 1
事件2008 9th International Conference on Solid-State and Integrated-Circuit Technology, ICSICT 2008 - Beijing, China
持續時間: 2008 10月 202008 10月 23

出版系列

名字International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT

Other

Other2008 9th International Conference on Solid-State and Integrated-Circuit Technology, ICSICT 2008
國家/地區China
城市Beijing
期間08-10-2008-10-23

All Science Journal Classification (ASJC) codes

  • 電氣與電子工程
  • 凝聚態物理學
  • 電子、光磁材料

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