Contact printing of metallic pattern and its applications on fabricating high-frequency surface acoustic wave (SAW) devices

Yung Chun Lee, Chun Hung Chen, Hsueh Liang Chen, Chin Hsin Liu, Cheng Yu Chiu, Hung Yi Lin

研究成果: Conference contribution

摘要

In this paper, two types of contact-printing methods for micro/nano-lithography are developed and their application on fabricating high-frequency surface acoustic wave (SAW) devices are investigated. First of all, a Light-Assisted Metal Film Patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments. Secondly, a Contact-Transfer and Mask-Embedded Lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nano-structures on various kinds of substrates. Applications of these two developed methods are demonstrated on the fabrication of high-frequency (∼2 GHz) surface acoustic wave (SAW) filters and resonators. Future developments and potential applications of these nanoimprinting and nano-patterning methods will be addressed.

原文English
主出版物標題ICSICT 2008 - 2008 9th International Conference on Solid-State and Integrated-Circuit Technology Proceedings
頁面2456-2459
頁數4
DOIs
出版狀態Published - 2008 十二月 1
事件2008 9th International Conference on Solid-State and Integrated-Circuit Technology, ICSICT 2008 - Beijing, China
持續時間: 2008 十月 202008 十月 23

出版系列

名字International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT

Other

Other2008 9th International Conference on Solid-State and Integrated-Circuit Technology, ICSICT 2008
國家China
城市Beijing
期間08-10-2008-10-23

指紋

Acoustic surface wave devices
surface acoustic wave devices
printing
Printing
metal films
Lithography
Light Metals
lithography
Metals
Acoustic surface wave filters
Silicon
Substrates
Interfacial energy
surface energy
Masks
Resonators
masks
resonators
filters
Heating

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

引用此文

Lee, Y. C., Chen, C. H., Chen, H. L., Liu, C. H., Chiu, C. Y., & Lin, H. Y. (2008). Contact printing of metallic pattern and its applications on fabricating high-frequency surface acoustic wave (SAW) devices. 於 ICSICT 2008 - 2008 9th International Conference on Solid-State and Integrated-Circuit Technology Proceedings (頁 2456-2459). [4735086] (International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT). https://doi.org/10.1109/ICSICT.2008.4735086
Lee, Yung Chun ; Chen, Chun Hung ; Chen, Hsueh Liang ; Liu, Chin Hsin ; Chiu, Cheng Yu ; Lin, Hung Yi. / Contact printing of metallic pattern and its applications on fabricating high-frequency surface acoustic wave (SAW) devices. ICSICT 2008 - 2008 9th International Conference on Solid-State and Integrated-Circuit Technology Proceedings. 2008. 頁 2456-2459 (International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT).
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abstract = "In this paper, two types of contact-printing methods for micro/nano-lithography are developed and their application on fabricating high-frequency surface acoustic wave (SAW) devices are investigated. First of all, a Light-Assisted Metal Film Patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments. Secondly, a Contact-Transfer and Mask-Embedded Lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nano-structures on various kinds of substrates. Applications of these two developed methods are demonstrated on the fabrication of high-frequency (∼2 GHz) surface acoustic wave (SAW) filters and resonators. Future developments and potential applications of these nanoimprinting and nano-patterning methods will be addressed.",
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Lee, YC, Chen, CH, Chen, HL, Liu, CH, Chiu, CY & Lin, HY 2008, Contact printing of metallic pattern and its applications on fabricating high-frequency surface acoustic wave (SAW) devices. 於 ICSICT 2008 - 2008 9th International Conference on Solid-State and Integrated-Circuit Technology Proceedings., 4735086, International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT, 頁 2456-2459, 2008 9th International Conference on Solid-State and Integrated-Circuit Technology, ICSICT 2008, Beijing, China, 08-10-20. https://doi.org/10.1109/ICSICT.2008.4735086

Contact printing of metallic pattern and its applications on fabricating high-frequency surface acoustic wave (SAW) devices. / Lee, Yung Chun; Chen, Chun Hung; Chen, Hsueh Liang; Liu, Chin Hsin; Chiu, Cheng Yu; Lin, Hung Yi.

ICSICT 2008 - 2008 9th International Conference on Solid-State and Integrated-Circuit Technology Proceedings. 2008. p. 2456-2459 4735086 (International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT).

研究成果: Conference contribution

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AB - In this paper, two types of contact-printing methods for micro/nano-lithography are developed and their application on fabricating high-frequency surface acoustic wave (SAW) devices are investigated. First of all, a Light-Assisted Metal Film Patterning (LAMP) method which transfers a patterned metal film directly from a silicon mold to a substrate is discussed. The pattern transformation relies on both mechanical contact pressure and optical heating at the interface. Metal patterns with 100 nm feature size can be easily transferred in laboratory using simple equipments. Secondly, a Contact-Transfer and Mask-Embedded Lithography (CMEL) is proposed which cleverly arranges pure mechanical forces and surface energy difference to achieve the patterning of nano-structures on various kinds of substrates. Applications of these two developed methods are demonstrated on the fabrication of high-frequency (∼2 GHz) surface acoustic wave (SAW) filters and resonators. Future developments and potential applications of these nanoimprinting and nano-patterning methods will be addressed.

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Lee YC, Chen CH, Chen HL, Liu CH, Chiu CY, Lin HY. Contact printing of metallic pattern and its applications on fabricating high-frequency surface acoustic wave (SAW) devices. 於 ICSICT 2008 - 2008 9th International Conference on Solid-State and Integrated-Circuit Technology Proceedings. 2008. p. 2456-2459. 4735086. (International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT). https://doi.org/10.1109/ICSICT.2008.4735086