Control charts for profile monitoring of within-profile correlations using the Tweedie exponential dispersion process model

Chung I. Li, Meng Rong Tsai

研究成果: Article同行評審

2 引文 斯高帕斯(Scopus)

摘要

In some manufacturing processes, the quality of a product can be characterized by the functional relationship between the response variable and the explanatory variables. Profile monitoring is a tool used to examine the stability of the functional relationship over time. Many studies have pointed out that the measurements within a profile are uncorrelated. In this research, to take advantage of the ability to provide a comprehensive description of a wide variety of data, the Tweedie exponential dispersion process model is used to account for the within-profile correlation. Then, two exponentially weighted moving average control charts are developed to detect process changes during a Phase II application. In the simulation studies, we showed that our proposed control charts outperform the existing methods for monitoring linear and nonlinear profiles. Finally, two numerical examples are given to demonstrate the usefulness of our proposed control charts.

All Science Journal Classification (ASJC) codes

  • 統計與概率
  • 建模與模擬
  • 統計、概率和不確定性
  • 應用數學

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