Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

I. Ling Hsu; Fang Hao Yeh; Yu Cheng Chin; Chun In Cheung; Zi Chun Chia; Li Xing Yang; Ya Jyun Chen; Ting Yu Cheng; Shu Pao Wu; Pei Jane Tsai; Nan Yao Lee; Mei Yi Liao; Chih Chia Huang

doi:10.1016/j.cej.2021.131957

Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

I. Ling Hsu, Fang Hao Yeh, Yu Cheng Chin, Chun In Cheung, Zi Chun Chia, Li Xing Yang, Ya Jyun Chen, Ting Yu Cheng, Shu Pao Wu, Pei Jane Tsai, Nan Yao Lee, Mei Yi Liao, Chih Chia Huang

研究成果: Comment/debate › 同行評審

摘要

In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.

原文	English
文章編號	131957
期刊	Chemical Engineering Journal
卷	428
DOIs	https://doi.org/10.1016/j.cej.2021.131957
出版狀態	Published - 2022 1月 15

All Science Journal Classification (ASJC) codes

化學 (全部)
環境化學
化學工程 (全部)
工業與製造工程

存取文件

10.1016/j.cej.2021.131957

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深入研究「Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))」主題。共同形成了獨特的指紋。

引用此

Hsu, I. L., Yeh, F. H., Chin, Y. C., Cheung, C. I., Chia, Z. C., Yang, L. X., Chen, Y. J., Cheng, T. Y., Wu, S. P., Tsai, P. J., Lee, N. Y., Liao, M. Y., & Huang, C. C. (2022). Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). Chemical Engineering Journal, 428, [131957]. https://doi.org/10.1016/j.cej.2021.131957

Hsu, I. Ling ; Yeh, Fang Hao ; Chin, Yu Cheng 等. / Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles : New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). 於: Chemical Engineering Journal. 2022 ; 卷 428.

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title = "Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))",

abstract = "In this article, we supplement the Supporting Information (Figs. S1–S16 and Table S1) which was missing due to our negligence in proofreading when published in the paper “Chemical Engineering Journal 409 (2021) 128266”. All the authors apologize for any inconvenience caused.",

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doi = "10.1016/j.cej.2021.131957",

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Hsu, IL, Yeh, FH, Chin, YC, Cheung, CI, Chia, ZC, Yang, LX, Chen, YJ, Cheng, TY, Wu, SP, Tsai, PJ , Lee, NY, Liao, MY & Huang, CC 2022, 'Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))', Chemical Engineering Journal, 卷 428, 131957. https://doi.org/10.1016/j.cej.2021.131957

Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). / Hsu, I. Ling; Yeh, Fang Hao; Chin, Yu Cheng 等.
於: Chemical Engineering Journal, 卷 428, 131957, 15.01.2022.

研究成果: Comment/debate › 同行評審

TY - JOUR

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T2 - New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

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AU - Yeh, Fang Hao

AU - Chin, Yu Cheng

AU - Cheung, Chun In

AU - Chia, Zi Chun

AU - Yang, Li Xing

AU - Chen, Ya Jyun

AU - Cheng, Ting Yu

AU - Wu, Shu Pao

AU - Tsai, Pei Jane

AU - Lee, Nan Yao

AU - Liao, Mei Yi

AU - Huang, Chih Chia

PY - 2022/1/15

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Hsu IL, Yeh FH, Chin YC, Cheung CI, Chia ZC, Yang LX 等. Corrigendum to “Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations” [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266)). Chemical Engineering Journal. 2022 1月 15;428:131957. doi: 10.1016/j.cej.2021.131957