CVD flow field modeling using the Quiet Direct Simulation (QDS) method

H. M. Cave, C. W. Lim, M. C. Jermy, J. S. Wu, M. R. Smith, S. P. Krumdieck

研究成果: Conference contribution

1 引文 斯高帕斯(Scopus)

摘要

In this paper, the Quiet Direct Simulation (QDS) method is used to model the unsteady jet development in a Pulsed Pressure Chemical Vapour Deposition (PP-CVD) reactor. QDS is a novel method of gas flow simulation which is able to compute true-direction fluxes of mass, momentum and energy in a computationally efficient and accurate manner. The scheme is ideal for the simulation of novel CVD processes like PP-CVD which include highly unsteady flow structures and which has previously proved extremely difficult to simulate. Here, the axisymmetric QDS solver is outlined and the injection phase of a PP-CVD reactor is simulated.

原文English
主出版物標題ECS Transactions - EuroCVD 17/CVD 17
頁面389-396
頁數8
版本8 PART 1
DOIs
出版狀態Published - 2009
事件17th International Chemical Vapor Deposition Symposium (CVD-XVII) - 216th Meeting of the Electrochemical Society - Vienna, Austria
持續時間: 2009 十月 42009 十月 9

出版系列

名字ECS Transactions
號碼8 PART 1
25
ISSN(列印)1938-5862
ISSN(電子)1938-6737

Other

Other17th International Chemical Vapor Deposition Symposium (CVD-XVII) - 216th Meeting of the Electrochemical Society
國家Austria
城市Vienna
期間09-10-0409-10-09

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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