Degradation of phenol using low concentration of ferric ions by the photo-Fenton process

Yao Hui Huang, Yu Jen Huang, Hung Chih Tsai, Hung Ta Chen

研究成果: Article同行評審

48 引文 斯高帕斯(Scopus)

摘要

In this study, phenol was degraded by the photo-Fenton process at pH 3, 5mg/L Fe(III), 1080mg/L H2O2 using 3 UV lamps (365nm). In the UV/H2O2 system, the degradation of phenol is inefficient, and only around 25% of the phenol is degraded in 1h. The efficiency of the photo-Fenton system considerably exceeded that in UV/H2O2 and Fenton-like systems. The removal efficiency of COD by the photo-Fenton process was 98% respectively, but only 63% in the Fenton-like system. The effect of oxalate on the degradation of phenol was also investigated. The removal efficiency of phenol was highest at a molar concentration ratio of oxalic acid to ferric ions ([Ox]/[Fe3+]) of 2. Increasing the amount of dissolved oxygen promoted the degradation of phenol. Even when concentration of added ferric ions in the photo-Fenton system was low, the COD removal efficiency was still satisfactory. The intermediate organic acids during the degradation of phenol were formic acid, acetic acid, oxalic acid and succinic acid. The pathway of phenol degradation in the photo-Fenton process is proposed from experimental results and the literature.

原文English
頁(從 - 到)699-704
頁數6
期刊Journal of the Taiwan Institute of Chemical Engineers
41
發行號6
DOIs
出版狀態Published - 2010 十一月

All Science Journal Classification (ASJC) codes

  • 化學 (全部)
  • 化學工程 (全部)

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