Dependence of compositions and crystallization behaviors of dc-sputtered TiNi thin films on the deposition conditions

研究成果: Article

10 引文 斯高帕斯(Scopus)

摘要

The dependence of tin concentrations and crystallization behaviour of various tin-nickel thin film alloys on the processing conditions were investigated. The activation energies of tin-nickel thin films with three compositions were determined using Kissinger method. It was found that for higher dc power, tin at % was higher if the pressures were less than 20 m Torr, or else tin at % was lower if pressures were greater than or equal to 20 m Torr. The deposition rate was found to increase with the working distance and pressure and the activation energy examined was found to differ from that of bulk materials.

原文English
頁(從 - 到)2382-2387
頁數6
期刊Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
19
發行號5
DOIs
出版狀態Published - 2001 一月 1

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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