The dependence of tin concentrations and crystallization behaviour of various tin-nickel thin film alloys on the processing conditions were investigated. The activation energies of tin-nickel thin films with three compositions were determined using Kissinger method. It was found that for higher dc power, tin at % was higher if the pressures were less than 20 m Torr, or else tin at % was lower if pressures were greater than or equal to 20 m Torr. The deposition rate was found to increase with the working distance and pressure and the activation energy examined was found to differ from that of bulk materials.
|頁（從 - 到）||2382-2387|
|期刊||Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films|
|出版狀態||Published - 2001 一月 1|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films