Dependence of silicon fracture strength and surface morphology on deep reactive ion etching parameters

Kuo Shen Chen, Arturo A. Ayon, Kevin A. Lohner, Mark A. Kepets, Terran K. Melconian, S. Mark Spearing

研究成果: Conference article同行評審

6 引文 斯高帕斯(Scopus)

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深入研究「Dependence of silicon fracture strength and surface morphology on deep reactive ion etching parameters」主題。共同形成了獨特的指紋。

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds