Deposition and characteristics of iron-silicon thin film catalyst for CNT growth

Jyh Ming Ting, Shih Wei Hung

研究成果: Article同行評審

11 引文 斯高帕斯(Scopus)

摘要

Fe-Si catalyst thin films for the growth of carbon nanotubes were prepared using co-sputter deposition. As-deposited Fe-Si films consist of different amounts of α-Fe and amorphous Si. The amount depends on the Si concentration in the film. Hydrogen plasma etched Fe-Si films become particles having different sizes. The particle size is also dependent on the Si concentration. Correlation among the Si concentration, the particle size, and the growth rate of carbon nanotube was made. Optimal growth of carbon nanotubes at 370 °C was obtained at an average particle size of 45 nm or a Si concentration of 21%.

原文English
頁(從 - 到)1834-1838
頁數5
期刊Diamond and Related Materials
15
發行號11-12 SPEC. ISS.
DOIs
出版狀態Published - 2006 十一月

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 化學 (全部)
  • 機械工業
  • 材料化學
  • 電氣與電子工程

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