Design Considerations with Augmented Spacer Dielectric for Vertically Stacked Gate-All-Around MOSFET,

Ya Chi Huang, Shi Hao Chen, Meng-Hsueh Chiang, Shui-Jinn Wang

研究成果: Conference contribution

原文English
主出版物標題IEEE Semiconductor Interface Specialists Conference
出版狀態Published - 2018 五月 21

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