TY - JOUR
T1 - Developed diamond wire sawing technique with high slicing ability for multicrystalline silicon wafers
AU - Wang, Ting Chun
AU - Yeh, Tsung Han
AU - Chu, Shao Yu
AU - Lee, Hsin Ying
AU - Lee, Ching Ting
N1 - Funding Information:
This work was supported by the Ministry of Science and Technology of the Republic of China under contract No. MOST 107-2221-E-006-144 and MOST 108-2221-E-006-196-MY3.
Publisher Copyright:
© 2020 Taylor & Francis.
Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2020/11/17
Y1 - 2020/11/17
N2 - In this work, various reciprocating cycle times of 80, 160, 240, and 320 sec in the diamond wire sawing (DWS) process were adjusted to improve the slicing ability in solar industry. During the same slicing time, the long reciprocating cycle time had less velocity inverse points in comparison with the short reciprocating cycle time. Consequently, the total friction force of the slicing wires used in the DWS process with the short reciprocating cycle time was larger than that of the slicing wires used in the DWS process with the long reciprocating cycle time. It was noting that the lower diamond consumption and better slicing ability in the DWS process with a reciprocating cycle time of 320 sec was obtained in comparison with a reciprocating cycle time of 80 sec. However, since the diamond grits with too high slicing strength to collide the Si material, the serious damages were form on the wafer edge. Therefore, the edge chipping increased to 1.63% as the reciprocating cycle time of 320 sec. The highest mass production yield of 94.22% and the lowest edge chipping of 1.23% for the DWS-sliced mc-Si wafers were obtained as the suitable reciprocating cycle time was 240 sec.
AB - In this work, various reciprocating cycle times of 80, 160, 240, and 320 sec in the diamond wire sawing (DWS) process were adjusted to improve the slicing ability in solar industry. During the same slicing time, the long reciprocating cycle time had less velocity inverse points in comparison with the short reciprocating cycle time. Consequently, the total friction force of the slicing wires used in the DWS process with the short reciprocating cycle time was larger than that of the slicing wires used in the DWS process with the long reciprocating cycle time. It was noting that the lower diamond consumption and better slicing ability in the DWS process with a reciprocating cycle time of 320 sec was obtained in comparison with a reciprocating cycle time of 80 sec. However, since the diamond grits with too high slicing strength to collide the Si material, the serious damages were form on the wafer edge. Therefore, the edge chipping increased to 1.63% as the reciprocating cycle time of 320 sec. The highest mass production yield of 94.22% and the lowest edge chipping of 1.23% for the DWS-sliced mc-Si wafers were obtained as the suitable reciprocating cycle time was 240 sec.
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U2 - 10.1080/10426914.2020.1802037
DO - 10.1080/10426914.2020.1802037
M3 - Article
AN - SCOPUS:85089457176
VL - 35
SP - 1727
EP - 1731
JO - Materials and Manufacturing Processes
JF - Materials and Manufacturing Processes
SN - 1042-6914
IS - 15
ER -