Development of a dual-phase virtual metrology scheme

研究成果: Conference contribution

2 引文 斯高帕斯(Scopus)

摘要

This work proposes a Dual-phase virtual metrology scheme. To consider both promptness and accuracy, this scheme generates dual-phase virtual metrology (VM) values. Phase I emphasizes promptness; that is to immediately calculate and output the Phase-I VM value (denoted VMI) of a workpiece (wafer or glass) once the entire process data of the workpiece are completely collected. Phase II intensifies accuracy; that is not to re-calculate and output the Phase-II VM values (denoted VMII) of all the workpieces in the cassette (also called FOUP in the semiconductor industry) until an actual metrology value (required for tuning or re-training purposes) of a workpiece in the same cassette is collected. Besides, in this scheme, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated. The RI and GSI are applied to gauge the degree of reliance. If the reliance level of a VM value is lower than the threshold, this VM value may not be adopted. An illustrative example involving fifth-generation TFT-LCD CVD equipment is presented. Experimental results demonstrate that the proposed scheme is applicable to the wafer-to-wafer or glass-to-glass advanced process control for semiconductor or TFT-LCD factories.

原文English
主出版物標題Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
頁面270-275
頁數6
DOIs
出版狀態Published - 2007 十二月 1
事件3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007 - Scottsdale, AZ, United States
持續時間: 2007 九月 222007 九月 25

出版系列

名字Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007

Other

Other3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
國家/地區United States
城市Scottsdale, AZ
期間07-09-2207-09-25

All Science Journal Classification (ASJC) codes

  • 控制與系統工程
  • 電氣與電子工程

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