Development of a dual-stage virtual metrology architecture for TFT-LCD manufacturing

Yu Chuan Su, Wen Huang Tsai, Fan Tien Cheng, Wei Ming Wu

研究成果: Conference contribution

2 引文 斯高帕斯(Scopus)

摘要

Processing quality of thin film transistor-liquid crystal display (TFT-LCD) manufacturing is a key factor for production yield. In general, the processing quality of production equipment is not only related to its own manufacturing process but also affected by the process result of the previous equipment. Current proposed virtual metrology (VM) architectures are all applied to conjecture processing quality of a single stage. These single-stage VM architectures lack the ability of detecting the processing drift occur between different stages. This paper proposes a novel dual-stage VM architecture for quality conjecturing that involves two pieces of equipment. The architecture consists of two stages. In Stage I, the fore-equipment VM model is established as usual and then the rear-equipment VM model that depends on stage-I VM output is built in Stage II. An example of the proposed dual-stage VM architecture applied to two sets of TFT-LCD chemical vapor deposition (CVD) equipment is presented. Experimental results demonstrate that this dual-stage VM architecture is promising for TFT-LCD manufacturing.

原文English
主出版物標題2008 IEEE International Conference on Robotics and Automation, ICRA 2008
頁面3630-3635
頁數6
DOIs
出版狀態Published - 2008 九月 18
事件2008 IEEE International Conference on Robotics and Automation, ICRA 2008 - Pasadena, CA, United States
持續時間: 2008 五月 192008 五月 23

出版系列

名字Proceedings - IEEE International Conference on Robotics and Automation
ISSN(列印)1050-4729

Other

Other2008 IEEE International Conference on Robotics and Automation, ICRA 2008
國家/地區United States
城市Pasadena, CA
期間08-05-1908-05-23

All Science Journal Classification (ASJC) codes

  • 軟體
  • 控制與系統工程
  • 人工智慧
  • 電氣與電子工程

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