Development of a generic virtual metrology framework

Hsien Cheng Huang, Yu Chuan Su, Fan Tien Cheng, Jia Mau Jian

研究成果: Conference contribution

15 引文 斯高帕斯(Scopus)

摘要

Virtual metrology (VM) is a technology to predict metrology variables using information about the state of the process for every workpiece. An advanced dual-phase VM scheme possessing the properties of data preprocessing, dual-phase conjecturing, reliance-level evaluating, and similarity-level appraising was proposed by the author. This dual-phase VM scheme is applicable for all the typical VM applications. Among those applications, the one for workpiece-to-workpiece (W2W) advanced process control (APC) is the most critical. For easy implementation and deployment, a generic-virtual-metrology (GVM) framework shall be designed. The purpose of this paper is to develop the GVM framework. By applying this GVM framework, different VM functional modules can be easily implemented and applied for various kinds of VM applications, especially the W2W APC.

原文English
主出版物標題Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
頁面282-287
頁數6
DOIs
出版狀態Published - 2007
事件3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007 - Scottsdale, AZ, United States
持續時間: 2007 九月 222007 九月 25

出版系列

名字Proceedings of the 3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007

Other

Other3rd IEEE International Conference on Automation Science and Engineering, IEEE CASE 2007
國家/地區United States
城市Scottsdale, AZ
期間07-09-2207-09-25

All Science Journal Classification (ASJC) codes

  • 控制與系統工程
  • 電氣與電子工程

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