Development of the nano-measuring machine stage

Wen Yuh Jywe, Yeau Ren Jeng, Yun Feng Teng, Hung Shu Wang, Chia Hung Wu

研究成果: Conference contribution

4 引文 斯高帕斯(Scopus)

摘要

In this paper, it was successfully developed a nano-measuring machine stage. It was used the features of a flexible structure to develop the nano-measuring machine stage. This stage includes two parts: one is a long range positioning X-Y stage and the other one is a four degrees-of-freedomicro-range stage. The flexible structure of the four degrees-of-freedom micro-range stage was included two kinds of an arc flexible body and a new two degrees-of-freedom flexible body. The micro-range stage was designed to compensate the moving errors such as vertical straightness error, pitch error and roll errors and its all moving range is 20mm × 20mm × 11μm. Precision feedback is provided by the six degrees-of-freedom measuring system with integrating the three plane mirror interferometers and a two degrees-of-freedom angular sensor.

原文English
主出版物標題Proceedings of the 33rd Annual Conference of the IEEE Industrial Electronics Society, IECON
頁面2970-2973
頁數4
DOIs
出版狀態Published - 2007 12月 1
事件33rd Annual Conference of the IEEE Industrial Electronics Society, IECON - Taipei, Taiwan
持續時間: 2007 11月 52007 11月 8

出版系列

名字IECON Proceedings (Industrial Electronics Conference)

Other

Other33rd Annual Conference of the IEEE Industrial Electronics Society, IECON
國家/地區Taiwan
城市Taipei
期間07-11-0507-11-08

All Science Journal Classification (ASJC) codes

  • 控制與系統工程
  • 電氣與電子工程

指紋

深入研究「Development of the nano-measuring machine stage」主題。共同形成了獨特的指紋。

引用此