Digital atomic force microscope Moiré method

Chia Ming Liu, Lien Wen Chen

研究成果: Article同行評審

11 引文 斯高帕斯(Scopus)

摘要

In this study, a novel digital atomic force microscope (AFM) moiré method is established to measure the displacement and strain fields. The moiré pattern is generated by the interference between the specimen grating and the virtual reference grating formed by digital image processes. The overlapped image is filtered by the 2-D wavelet transformation to obtain clear interference moiré patterns. From moiré patterns, the displacement and strain fields can be analyzed. The experimental results show that the digital AFM moiré method is very sensitive and easy to realize in nanoscale measurements.

原文English
頁(從 - 到)173-181
頁數9
期刊Ultramicroscopy
101
發行號2-4
DOIs
出版狀態Published - 2004 十一月

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 原子與分子物理與光學
  • 儀器

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