Direct measurement of surface stress during Bi-mediated Ge growth on Si

Hidehito Asaoka, Tatsuya Yamazaki, Kenji Yamaguchi, Shin Ichi Shamoto, Sergey Filimonov, Maki Suemitsu

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

摘要

We have focused on stress measurements during Bi termination of Si (111) and Ge growth on this Bi-mediated Si (111). In order to obtain information on both the surface stress and the surface structure simultaneously, we have combined the surface-curvature and the reflection-high-electron-energy- diffraction instrumentations in an identical ultrahigh vacuum system. We find the Bi-terminated Si (111) √3 × √3-β surface releases 1.8 N/m (= J/m2), or (1.4 eV/(1 × 1 unit cell)), of the surface energy from the strong tensile Si (111) 7 × 7 reconstruction. Subsequent Ge deposition on the Bi-terminated Si surface develops a compressive stress, which oscillates with a period corresponding to the growth of a single bilayer. The real-time stress measurement provides a direct evidence for this oscillatory stress relaxation in the layer-by-layer growth.

原文English
頁(從 - 到)157-160
頁數4
期刊Surface Science
609
DOIs
出版狀態Published - 2013 3月

All Science Journal Classification (ASJC) codes

  • 凝聚態物理學
  • 表面和介面
  • 表面、塗料和薄膜
  • 材料化學

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