Direct metal contact printing lithography for patterning sub-micrometer surface structures on a sapphire substrate

Yi Ta Hsieh, Yung Chun Lee

研究成果: Article

16 引文 斯高帕斯(Scopus)

摘要

This paper reports the application of novel contact printing lithography to fabricating patterned sapphire substrates (PSSs) used in light emitting diodes (LEDs). This contact printing lithography method can directly transfer a metal film pattern from a silicon mold to a sapphire substrate, and subsequently use the transferred metal film pattern as the etching mask for inductively coupled plasma etching on the sapphire substrate. The strength of this new approach lies on its capability of achieving sub-micrometer-or nanometer-scaled patterning in a direct, easy and large-area way as well as for obtaining deeper etching depth on sapphire because of excellent etching selectivity of metal films. Experiments have been carried out to demonstrate the feasibility of using this new approach for obtaining sub-micrometer surface structures on the complete surface area of a 2″ sapphire substrate. The PSSs can be used for high brightness LEDs.

原文English
文章編號015001
期刊Journal of Micromechanics and Microengineering
21
發行號1
DOIs
出版狀態Published - 2011 一月 1

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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