Dual-phase virtual metrlogy method

貢獻的翻譯標題: 雙階段虛擬量測方法

Fan-Tien Cheng (Inventor)

研究成果: Patent

摘要

A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.
原文English
專利號10-0915339
出版狀態Published - 1800

指紋

Tuning

引用此文

Cheng, F-T. (1800). Dual-phase virtual metrlogy method. (專利號 10-0915339).
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Cheng, F-T 1800, Dual-phase virtual metrlogy method, 專利號 10-0915339.

Dual-phase virtual metrlogy method. / Cheng, Fan-Tien (Inventor).

專利號: 10-0915339.

研究成果: Patent

TY - PAT

T1 - Dual-phase virtual metrlogy method

AU - Cheng, Fan-Tien

PY - 1800

Y1 - 1800

N2 - A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.

AB - A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.

M3 - Patent

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ER -

Cheng F-T, 發明者. Dual-phase virtual metrlogy method. 10-0915339. 1800.