Dual-phase virtual metrlogy method

貢獻的翻譯標題: 雙階段虛擬量測方法

Fan-Tien Cheng (Inventor)

研究成果: Patent

摘要

A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.
貢獻的翻譯標題雙階段虛擬量測方法
原文English
專利號7603328
出版狀態Published - 2008 十二月 11

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