Dual-phase virtual metrlogy method

貢獻的翻譯標題: 雙階段虛擬量測方法

Fan-Tien Cheng (Inventor)

研究成果: Patent

摘要

A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.
原文English
專利號7603328
出版狀態Published - 2008 十二月 11

    指紋

引用此

Cheng, F-T. (2008). Dual-phase virtual metrlogy method. (專利號 7603328).