摘要
The effect of two-dimensional diatomic-island nucleation on the linear stability of the step morphology during molecular beam epitaxy is investigated numerically via shooting methods. It is found that the effect of diatomic islands on the step morphological stability is significant. The greater the effects of diatomic islands, the more stable the step morphology. Increasing capture efficiency can decrease the critical surface capillary length and shift the critical wave number toward short-wavelength regimes. The unstable region is shrunk with increasing capture efficiency. Further, increasing flux coverage and/or surface coverage can decrease the critical surface capillary length and shift the critical wave number toward short-wavelength regimes.
原文 | English |
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頁(從 - 到) | 174-181 |
頁數 | 8 |
期刊 | Thin Solid Films |
卷 | 353 |
發行號 | 1 |
DOIs | |
出版狀態 | Published - 1999 9月 29 |
All Science Journal Classification (ASJC) codes
- 電子、光磁材料
- 表面和介面
- 表面、塗料和薄膜
- 金屬和合金
- 材料化學