Effect of diatomic islands on step morphological stability of a terrace edge in molecular beam epitaxy

Senpuu Lin, Chi-Chuan Hwang, Hsin Sen Chu

研究成果: Article同行評審

1 引文 斯高帕斯(Scopus)

摘要

The effect of two-dimensional diatomic-island nucleation on the linear stability of the step morphology during molecular beam epitaxy is investigated numerically via shooting methods. It is found that the effect of diatomic islands on the step morphological stability is significant. The greater the effects of diatomic islands, the more stable the step morphology. Increasing capture efficiency can decrease the critical surface capillary length and shift the critical wave number toward short-wavelength regimes. The unstable region is shrunk with increasing capture efficiency. Further, increasing flux coverage and/or surface coverage can decrease the critical surface capillary length and shift the critical wave number toward short-wavelength regimes.

原文English
頁(從 - 到)174-181
頁數8
期刊Thin Solid Films
353
發行號1
DOIs
出版狀態Published - 1999 9月 29

All Science Journal Classification (ASJC) codes

  • 電子、光磁材料
  • 表面和介面
  • 表面、塗料和薄膜
  • 金屬和合金
  • 材料化學

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