Effect of oxygen partial pressure on electrical characteristics of amorphous indium gallium zinc oxide thin-film transistors fabricated by thermal annealing

C. J. Chiu, Z. W. Pei, S. T. Chang, S. P. Chang, S. J. Chang

研究成果: Article同行評審

19 引文 斯高帕斯(Scopus)

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Material Science

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