Effect of RF power on physical properties of MgTiO3 films by RF magnetron sputtering

Cheng Liang Huang, Yuan Bin Chen

研究成果: Article同行評審

3 引文 斯高帕斯(Scopus)

摘要

Physical properties of rf-sputtered crystalline MgTiO3 thin films deposited on n-type Si(100) substrates at different rf powers have been investigated. These films were fabricated at 400°C by choosing different RF powers (from 100 to 400 W) at a substrate temperature of 400°C which is much lower than the bulk sintering temperature. X-ray diffraction (XRD) analysis showed that the deposited films exhibited a polycrystalline microstructure. The grain size of the films increased with increasing RF power. The electrical properties were measured using C-V and I-V measurements on metal-insulator- semiconductor (MIS) capacitor structures. At an RF power of 400 W and a substrate temperature of 400°C, a dielectric constant of 16.2 (f = 10 MHz), a leakage current density of 2.03 × 10-9 A/mm2 and a dissipation factor of 0.041 were obtained.

原文English
頁(從 - 到)6736-6738
頁數3
期刊Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
44
發行號9 A
DOIs
出版狀態Published - 2005 九月 8

All Science Journal Classification (ASJC) codes

  • Engineering(all)
  • Physics and Astronomy(all)

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