Effect of substrate on the step coverage of plasma-enhanced chemical-vapor deposited tetraethylorthoslllcate films

Jin Kun Lan; Ylng Lang Wang; Chuen Guang Chao; Kuang-Yao Lo; Yi Lung Cheng

Effect of substrate on the step coverage of plasma-enhanced chemical-vapor deposited tetraethylorthoslllcate films

Jin Kun Lan, Ylng Lang Wang, Chuen Guang Chao, Kuang-Yao Lo, Yi Lung Cheng

物理學系

研究成果: Article › 同行評審

14 引文斯高帕斯（Scopus）

摘要

The dependence of the step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate (PE-TEOS) oxide film on the type of substrate was examined. Results showed that increasing the deposition time did not impact the effect of the substrate on the PE-TEOS deposition rate. The SiO ₂ substrate led to highest deposition rate during the initial deposition period of 5 s.

原文	English
頁（從 - 到）	1224-1229
頁數	6
期刊	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
卷	21
發行號	4
出版狀態	Published - 2003 7月 1

All Science Journal Classification (ASJC) codes

凝聚態物理學
電氣與電子工程

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abstract = "The dependence of the step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate (PE-TEOS) oxide film on the type of substrate was examined. Results showed that increasing the deposition time did not impact the effect of the substrate on the PE-TEOS deposition rate. The SiO 2 substrate led to highest deposition rate during the initial deposition period of 5 s.",

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AU - Lan, Jin Kun

AU - Wang, Ylng Lang

AU - Chao, Chuen Guang

AU - Lo, Kuang-Yao

AU - Cheng, Yi Lung

PY - 2003/7/1

Y1 - 2003/7/1

N2 - The dependence of the step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate (PE-TEOS) oxide film on the type of substrate was examined. Results showed that increasing the deposition time did not impact the effect of the substrate on the PE-TEOS deposition rate. The SiO 2 substrate led to highest deposition rate during the initial deposition period of 5 s.

AB - The dependence of the step coverage of plasma enhanced chemical vapor deposited (PECVD) tetraethylorthosilicate (PE-TEOS) oxide film on the type of substrate was examined. Results showed that increasing the deposition time did not impact the effect of the substrate on the PE-TEOS deposition rate. The SiO 2 substrate led to highest deposition rate during the initial deposition period of 5 s.

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JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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ER -

Effect of substrate on the step coverage of plasma-enhanced chemical-vapor deposited tetraethylorthoslllcate films

摘要

All Science Journal Classification (ASJC) codes

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