TY - JOUR
T1 - Effect of temperature on the deposition of ZnO thin films by successive ionic layer adsorption and reaction
AU - Shei, Shih Chang
AU - Lee, Pay Yu
AU - Chang, Shoou Jinn
N1 - Funding Information:
The authors would like to thank the Bureau of Energy, Ministry of Economic Affairs of Taiwan, ROC . for the financial support under contract no. 101-D0204-6 and the LED Lighting Research Center of NCKU for the assistance of device characterization, and the National Science Council of Taiwan, ROC ., under contract no. NSC 99-2221-E-024-009 and NSC 98-3114-E009-002-CC2 .
PY - 2012/8/1
Y1 - 2012/8/1
N2 - In this study, ZnO thin films were deposited on glass substrates by the successive ionic layer adsorption and reaction (SILAR) method, and the effect of the temperature treatment in ethylene glycol on the crystal structure, surface morphology, and optical properties of the films were investigated. When the temperature was below 85 °C, the ZnO films showed poor optical transmission and had a rough surface crystal structure. As the temperature was increased, dense polycrystalline films with uniform ZnO grain distribution were obtained. The optical transmittance of the ZnO thin films fabricated at temperatures greater than 95 °C was very high (90%) in the visible-light region. Therefore, it could be concluded that increasing the temperature of treatment in ethylene glycol helps in obtaining fine-grained ZnO films with a high growth rate and a low concentration of oxygen vacancies. However, temperatures greater than 145 °C led to shedding of ZnO from the surface and a reduction in the growth rate. Thus, temperature treatment was confirmed to play an important role in ZnO film deposition instead of post thermal annealing after the film growth.
AB - In this study, ZnO thin films were deposited on glass substrates by the successive ionic layer adsorption and reaction (SILAR) method, and the effect of the temperature treatment in ethylene glycol on the crystal structure, surface morphology, and optical properties of the films were investigated. When the temperature was below 85 °C, the ZnO films showed poor optical transmission and had a rough surface crystal structure. As the temperature was increased, dense polycrystalline films with uniform ZnO grain distribution were obtained. The optical transmittance of the ZnO thin films fabricated at temperatures greater than 95 °C was very high (90%) in the visible-light region. Therefore, it could be concluded that increasing the temperature of treatment in ethylene glycol helps in obtaining fine-grained ZnO films with a high growth rate and a low concentration of oxygen vacancies. However, temperatures greater than 145 °C led to shedding of ZnO from the surface and a reduction in the growth rate. Thus, temperature treatment was confirmed to play an important role in ZnO film deposition instead of post thermal annealing after the film growth.
UR - https://www.scopus.com/pages/publications/84862564656
UR - https://www.scopus.com/pages/publications/84862564656#tab=citedBy
U2 - 10.1016/j.apsusc.2012.05.004
DO - 10.1016/j.apsusc.2012.05.004
M3 - Article
AN - SCOPUS:84862564656
SN - 0169-4332
VL - 258
SP - 8109
EP - 8116
JO - Applied Surface Science
JF - Applied Surface Science
IS - 20
ER -